Nickel-Vanadium target is a functional target made from high-purity nickel (Ni) and vanadium (V) alloys, widely used in physical vapor deposition (PVD) and sputtering coating processes. With the excellent conductivity and corrosion resistance of nickel, and the high hardness and oxidation resistance of vanadium, the Nickel-Vanadium target can deposit high-hardness, dense, and wear-resistant thin films, matching the strict performance requirements in fields like optics, electronics, photovoltaics, and industrial functional coatings.
Core Advantages of Nickel-Vanadium Target
l High Purity
The purity generally ranges from 99.95% (3N5) to 99.999% (5N), with impurities such as Cr, Al, Mg controlled below 10ppm, and some cases require U/Th ≤ 1ppb. This much high purity ensures the quality of the thin film.
l Corrosion Resistance
It remains stable in acidic, alkaline, and high-temperature environments, making it suitable for harsh working conditions.
l Good Physical Properties
The density is approximately 8.0–8.9 g/cm³, the melting point is around 1350℃, and the coefficient of thermal expansion is 1.2×10⁻⁵/℃. These physical properties ensure the stability of the Nickel-Vanadium alloy target in various environments.
l Fine Grain Structure
The grain size of the Nickel-Vanadium alloy target is ≤150μm through a special preparation process, with fine and evenly distributed grains, ensuring the uniformity of the sputtered thin films and improving the sputtering rate.
Main Applications of Nickel-Vanadium Target
1. Integrated Circuits
In integrated circuit fabrication, pure gold is usually used for the surface conductive layer, but gold and silicon wafers can easily form low-melting-point compounds, leading to weak interface bonding. The Nickel-Vanadium alloy target can simultaneously sputter a nickel layer (bonding layer) and a vanadium layer (barrier layer), preventing gold-silicon diffusion and replacing traditional pure nickel targets, improving the performance and stability of integrated circuits.
2. Flat Panel Displays
It can be used for coating flat panel displays, enhancing their performance, such as i display quality screen wear resistance. In the field of thin-film solar cells, the Nickel-Vanadium alloy target can be used to prepare electrode layers, which helps in improving the photoelectric conversion efficiency of solar cells.
3. Aerospace
Due to its high strength and high-temperature resistance, the Nickel-Vanadium alloy target can be used to manufacture components for aircraft engines, missile parts, etc., meeting the high-performance material requirements of the aerospace industry.
4. Medical Field
It can be used to manufacture coatings for medical devices, providing wear resistance, corrosion resistance, and antibacterial properties, improving the longevity and safety of medical equipment.
5. Architectural Glass
It is used for coating large architectural glass, automotive glass, etc., achieving functions such as heat insulation, UV protection, and increasing glass strength, enhancing the performance and quality of glass.
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Customizable Ratio Metal Sputtering Target Nickel Vanadium NiV Alloy Target Images
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